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Good Quality Removal O2 in H2/N2 - Silica Gel – Gascheme

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Persisting in "High top quality, Prompt Delivery, Aggressive Price", now we have established long-term cooperation with customers from the two overseas and domestically and get new and aged clients' large comments for Catalysts in Refinery , CCR Reformer , Air Drying , The continual availability of significant grade merchandise in combination with our excellent pre- and after-sales support ensures strong competitiveness in an increasingly globalized market.
Good Quality Removal O2 in H2/N2 - Silica Gel – Gascheme Detail:

  Applications Material Size (mm) Shape
 GC-SG150 Purifying in PSA H2 unit SiO2&Al2O3 3.0~5.0 S
 GC-SG180 Drying and Purifying SiO2&Al2O3 2.5~4.5 S

Remark
Shape:  S-sphere  
Form:  Activated
We offer silica gels mainly used in PSA hydrogen processing and natural gas purifying processing.


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Gaining purchaser gratification is our company's aim eternally. We're going to make great initiatives to create new and top-quality products, satisfy your exclusive prerequisites and supply you with pre-sale, on-sale and after-sale solutions for Good Quality Removal O2 in H2/N2 - Silica Gel – Gascheme , The product will supply to all over the world, such as: Rwanda, Wellington, Belgium, Each product is carefully made, it will make you satisfied. Our merchandise in the production process have got strictly monitored, because it is only to supply you the best quality, we'll feel confident. High production costs but low prices for our long-term cooperation. You can have a variety choices and the value of all types are same reliable. If you have any question, do not hesitate to ask us.
We are a small company that has just started, but we get the company leader's attention and gave us a lot of help. Hope we can make progress together!
5 Stars By Althea from Swiss - 2018.09.29 13:24
High Quality, High Efficiency, Creative and Integrity, worth having long-term cooperation! Looking forward to the future cooperation!
5 Stars By Prudence from Netherlands - 2018.12.11 14:13
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